Enabling patterning of polymer optical devices working at visible wavelength using thermal nano-imprint lithography

Miguel Diez Garcia; Vincent Raimbault; Simon Joly; Laurent Oyhenart; Leire Bilbao; Chi Thanh Nguyen; Isabelle Ledoux-Rak; Laurent Bechou; Isabel Obieta; Corinne Dejous

doi:10.1109/DTIP.2017.7984456

Enabling patterning of polymer optical devices working at visible wavelength using thermal nano-imprint lithography

Miguel Diez Garcia, Vincent Raimbault, Simon Joly, Laurent Oyhenart, Leire Bilbao, Chi Thanh Nguyen, Isabelle Ledoux-Rak, Laurent Bechou, Isabel Obieta, Corinne Dejous

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

1 Citation (Scopus)

Abstract

Thermal Ultraviolet NanoImprint Lithography is a fast and reliable process to manufacture large scale integrated polymer-based optical components from a soft stamp. This technology already provides polymer integrated components for optical communications operating in the infrared region. However, several fabrication issues must be addressed to enable reliable mass production of optical components working in the visible region, especially when patterning large devices with nanometric features. In this work, we report our fabrication results on grating coupler and optical microring resonators with SU-8 resist. The device is conceived for monomode visible wavelength operation dedicated to future optical sensing applications. For this purpose, sub-micron waveguides are needed. We reported two main defects on soft stamp fabrication: Partial sidewall detachment and shifted or double embossing of the features. Nanoimprinting SU-8 waveguides was achieved with the operational devices of the soft stamp.

Original language	English
Title of host publication	Symposium on Design, Test, Integration and Packaging of MEMS/MOEMS, DTIP 2017
Editors	Benoit Charlot, Pascal Nouet, Claude Pellet, Yoshio Mita, Francis Pressecq, Peter Schneider, Stewart Smith
Publisher	Institute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)	9781538629529
DOIs	https://doi.org/10.1109/DTIP.2017.7984456
Publication status	Published - 18 Jul 2017
Event	19th Symposium on Design, Test, Integration and Packaging of MEMS/MOEMS, DTIP 2017 - Bordeaux, France Duration: 29 May 2017 → 1 Jun 2017

Publication series

Name	Symposium on Design, Test, Integration and Packaging of MEMS/MOEMS, DTIP 2017

Conference

Conference	19th Symposium on Design, Test, Integration and Packaging of MEMS/MOEMS, DTIP 2017
Country/Territory	France
City	Bordeaux
Period	29/05/17 → 1/06/17

Access to Document

10.1109/DTIP.2017.7984456

Cite this

Diez Garcia, M., Raimbault, V., Joly, S., Oyhenart, L., Bilbao, L., Nguyen, C. T., Ledoux-Rak, I., Bechou, L., Obieta, I., & Dejous, C. (2017). Enabling patterning of polymer optical devices working at visible wavelength using thermal nano-imprint lithography. In B. Charlot, P. Nouet, C. Pellet, Y. Mita, F. Pressecq, P. Schneider, & S. Smith (Eds.), Symposium on Design, Test, Integration and Packaging of MEMS/MOEMS, DTIP 2017 Article 7984456 (Symposium on Design, Test, Integration and Packaging of MEMS/MOEMS, DTIP 2017). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/DTIP.2017.7984456

Diez Garcia, Miguel ; Raimbault, Vincent ; Joly, Simon et al. / Enabling patterning of polymer optical devices working at visible wavelength using thermal nano-imprint lithography. Symposium on Design, Test, Integration and Packaging of MEMS/MOEMS, DTIP 2017. editor / Benoit Charlot ; Pascal Nouet ; Claude Pellet ; Yoshio Mita ; Francis Pressecq ; Peter Schneider ; Stewart Smith. Institute of Electrical and Electronics Engineers Inc., 2017. (Symposium on Design, Test, Integration and Packaging of MEMS/MOEMS, DTIP 2017).

@inproceedings{2699105f6dfc419a9cc777067e687887,

title = "Enabling patterning of polymer optical devices working at visible wavelength using thermal nano-imprint lithography",

abstract = "Thermal Ultraviolet NanoImprint Lithography is a fast and reliable process to manufacture large scale integrated polymer-based optical components from a soft stamp. This technology already provides polymer integrated components for optical communications operating in the infrared region. However, several fabrication issues must be addressed to enable reliable mass production of optical components working in the visible region, especially when patterning large devices with nanometric features. In this work, we report our fabrication results on grating coupler and optical microring resonators with SU-8 resist. The device is conceived for monomode visible wavelength operation dedicated to future optical sensing applications. For this purpose, sub-micron waveguides are needed. We reported two main defects on soft stamp fabrication: Partial sidewall detachment and shifted or double embossing of the features. Nanoimprinting SU-8 waveguides was achieved with the operational devices of the soft stamp.",

author = "{Diez Garcia}, Miguel and Vincent Raimbault and Simon Joly and Laurent Oyhenart and Leire Bilbao and Nguyen, {Chi Thanh} and Isabelle Ledoux-Rak and Laurent Bechou and Isabel Obieta and Corinne Dejous",

note = "Publisher Copyright: {\textcopyright} 2017 IEEE.; 19th Symposium on Design, Test, Integration and Packaging of MEMS/MOEMS, DTIP 2017 ; Conference date: 29-05-2017 Through 01-06-2017",

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doi = "10.1109/DTIP.2017.7984456",

language = "English",

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editor = "Benoit Charlot and Pascal Nouet and Claude Pellet and Yoshio Mita and Francis Pressecq and Peter Schneider and Stewart Smith",

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Diez Garcia, M, Raimbault, V, Joly, S, Oyhenart, L, Bilbao, L, Nguyen, CT, Ledoux-Rak, I, Bechou, L, Obieta, I & Dejous, C 2017, Enabling patterning of polymer optical devices working at visible wavelength using thermal nano-imprint lithography. in B Charlot, P Nouet, C Pellet, Y Mita, F Pressecq, P Schneider & S Smith (eds), Symposium on Design, Test, Integration and Packaging of MEMS/MOEMS, DTIP 2017., 7984456, Symposium on Design, Test, Integration and Packaging of MEMS/MOEMS, DTIP 2017, Institute of Electrical and Electronics Engineers Inc., 19th Symposium on Design, Test, Integration and Packaging of MEMS/MOEMS, DTIP 2017, Bordeaux, France, 29/05/17. https://doi.org/10.1109/DTIP.2017.7984456

Enabling patterning of polymer optical devices working at visible wavelength using thermal nano-imprint lithography. / Diez Garcia, Miguel; Raimbault, Vincent; Joly, Simon et al.
Symposium on Design, Test, Integration and Packaging of MEMS/MOEMS, DTIP 2017. ed. / Benoit Charlot; Pascal Nouet; Claude Pellet; Yoshio Mita; Francis Pressecq; Peter Schneider; Stewart Smith. Institute of Electrical and Electronics Engineers Inc., 2017. 7984456 (Symposium on Design, Test, Integration and Packaging of MEMS/MOEMS, DTIP 2017).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

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T1 - Enabling patterning of polymer optical devices working at visible wavelength using thermal nano-imprint lithography

AU - Diez Garcia, Miguel

AU - Raimbault, Vincent

AU - Joly, Simon

AU - Oyhenart, Laurent

AU - Bilbao, Leire

AU - Nguyen, Chi Thanh

AU - Ledoux-Rak, Isabelle

AU - Bechou, Laurent

AU - Obieta, Isabel

AU - Dejous, Corinne

PY - 2017/7/18

Y1 - 2017/7/18

N2 - Thermal Ultraviolet NanoImprint Lithography is a fast and reliable process to manufacture large scale integrated polymer-based optical components from a soft stamp. This technology already provides polymer integrated components for optical communications operating in the infrared region. However, several fabrication issues must be addressed to enable reliable mass production of optical components working in the visible region, especially when patterning large devices with nanometric features. In this work, we report our fabrication results on grating coupler and optical microring resonators with SU-8 resist. The device is conceived for monomode visible wavelength operation dedicated to future optical sensing applications. For this purpose, sub-micron waveguides are needed. We reported two main defects on soft stamp fabrication: Partial sidewall detachment and shifted or double embossing of the features. Nanoimprinting SU-8 waveguides was achieved with the operational devices of the soft stamp.

AB - Thermal Ultraviolet NanoImprint Lithography is a fast and reliable process to manufacture large scale integrated polymer-based optical components from a soft stamp. This technology already provides polymer integrated components for optical communications operating in the infrared region. However, several fabrication issues must be addressed to enable reliable mass production of optical components working in the visible region, especially when patterning large devices with nanometric features. In this work, we report our fabrication results on grating coupler and optical microring resonators with SU-8 resist. The device is conceived for monomode visible wavelength operation dedicated to future optical sensing applications. For this purpose, sub-micron waveguides are needed. We reported two main defects on soft stamp fabrication: Partial sidewall detachment and shifted or double embossing of the features. Nanoimprinting SU-8 waveguides was achieved with the operational devices of the soft stamp.

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BT - Symposium on Design, Test, Integration and Packaging of MEMS/MOEMS, DTIP 2017

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Diez Garcia M, Raimbault V, Joly S, Oyhenart L, Bilbao L, Nguyen CT et al. Enabling patterning of polymer optical devices working at visible wavelength using thermal nano-imprint lithography. In Charlot B, Nouet P, Pellet C, Mita Y, Pressecq F, Schneider P, Smith S, editors, Symposium on Design, Test, Integration and Packaging of MEMS/MOEMS, DTIP 2017. Institute of Electrical and Electronics Engineers Inc. 2017. 7984456. (Symposium on Design, Test, Integration and Packaging of MEMS/MOEMS, DTIP 2017). doi: 10.1109/DTIP.2017.7984456

Enabling patterning of polymer optical devices working at visible wavelength using thermal nano-imprint lithography

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