Evidence of covalent bond formation at the silane-metal interface during plasma polymerization of bis-1,2-(triethoxysilyl)ethane (BTSE) on aluminium

  • A. Batan*
  • , N. Mine
  • , B. Douhard
  • , F. Brusciotti
  • , I. De Graeve
  • , J. Vereecken
  • , M. Wenkin
  • , M. Piens
  • , H. Terryn
  • , J. J. Pireaux
  • , F. Reniers
  • *Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

24 Citations (Scopus)

Abstract

Silane and silane-like films were deposited from bis-1,2-(triethoxysilyl) ethane by vacuum and atmospheric plasma onto aluminium. Time-of-flight secondary ion mass spectrometry (ToF-SIMS) was used for probing the aluminium/plasma polymer film interface. An AlOSi+ fragment was identified at nominal mass m/z = 70.9539 amu, indicating a strong chemical interaction (formation of a covalent bond) at the substrate/film interface. Until now, this strong silane-aluminium interaction has never been observed in plasma polymer BTSE films. Ageing tests in an ultrasonic water bath combined with X-ray photoelectron spectroscopy measurements allowed to indirectly confirm good adhesion, and therefore the formation of a chemical bond at the interface.

Original languageEnglish
Pages (from-to)107-112
Number of pages6
JournalChemical Physics Letters
Volume493
Issue number1-3
DOIs
Publication statusPublished - 17 Jun 2010
Externally publishedYes

Keywords

  • BTSE
  • Plasma polymer films
  • Silane
  • ToF-SIMS
  • XPS

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