Influence of nitrogen implantation on the properties of Ti and substoichiometric TiNx films deposited on high speed steel

M. T. Rodrigo*, C. Jiménez, L. Vázquez, F. Alonso, M. Fernández, J. M. Martínez-Duart

*Corresponding author for this work

    Research output: Contribution to journalArticlepeer-review

    7 Citations (Scopus)

    Abstract

    Ti and TiNx (x < 1) thin films have been deposited on high speed steel (HSS) substrates by reactive sputtering and then N+ implanted. The increase of the N/Ti ratio of the films during deposition is related to a decrease in their roughness, and N+ implantation produces another additional slight decrease of the roughness. The hardness of samples increases with the nitrogen content in the as-deposited samples; nevertheless, N+-implanted Ti coatings show lower values of hardness than reactive sputtered TiNx films. α-Ti, ∈-Ti2N, and δ-TiN phases were identified by grazing x-ray diffraction.

    Original languageEnglish
    Pages (from-to)2117-2122
    Number of pages6
    JournalJournal of Materials Research
    Volume13
    Issue number8
    DOIs
    Publication statusPublished - Aug 1998

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