Influence of nitrogen implantation on the properties of Ti and substoichiometric TiNx films deposited on high speed steel

M. T. Rodrigo, C. Jiménez, L. Vázquez, F. Alonso, M. Fernández, J. M. Martínez-Duart

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    Abstract

    Ti and TiNx (x < 1) thin films have been deposited on high speed steel (HSS) substrates by reactive sputtering and then N+ implanted. The increase of the N/Ti ratio of the films during deposition is related to a decrease in their roughness, and N+ implantation produces another additional slight decrease of the roughness. The hardness of samples increases with the nitrogen content in the as-deposited samples; nevertheless, N+-implanted Ti coatings show lower values of hardness than reactive sputtered TiNx films. α-Ti, ∈-Ti2N, and δ-TiN phases were identified by grazing x-ray diffraction.

    Original languageEnglish
    Pages (from-to)2117-2122
    Number of pages6
    JournalJournal of Materials Research
    Volume13
    Issue number8
    DOIs
    Publication statusPublished - Aug 1998

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