TY - JOUR
T1 - Influence of nitrogen implantation on the properties of Ti and substoichiometric TiNx films deposited on high speed steel
AU - Rodrigo, M. T.
AU - Jiménez, C.
AU - Vázquez, L.
AU - Alonso, F.
AU - Fernández, M.
AU - Martínez-Duart, J. M.
PY - 1998/8
Y1 - 1998/8
N2 - Ti and TiNx (x < 1) thin films have been deposited on high speed steel (HSS) substrates by reactive sputtering and then N+ implanted. The increase of the N/Ti ratio of the films during deposition is related to a decrease in their roughness, and N+ implantation produces another additional slight decrease of the roughness. The hardness of samples increases with the nitrogen content in the as-deposited samples; nevertheless, N+-implanted Ti coatings show lower values of hardness than reactive sputtered TiNx films. α-Ti, ∈-Ti2N, and δ-TiN phases were identified by grazing x-ray diffraction.
AB - Ti and TiNx (x < 1) thin films have been deposited on high speed steel (HSS) substrates by reactive sputtering and then N+ implanted. The increase of the N/Ti ratio of the films during deposition is related to a decrease in their roughness, and N+ implantation produces another additional slight decrease of the roughness. The hardness of samples increases with the nitrogen content in the as-deposited samples; nevertheless, N+-implanted Ti coatings show lower values of hardness than reactive sputtered TiNx films. α-Ti, ∈-Ti2N, and δ-TiN phases were identified by grazing x-ray diffraction.
UR - https://www.scopus.com/pages/publications/0032137987
U2 - 10.1557/JMR.1998.0296
DO - 10.1557/JMR.1998.0296
M3 - Article
AN - SCOPUS:0032137987
SN - 0884-2914
VL - 13
SP - 2117
EP - 2122
JO - Journal of Materials Research
JF - Journal of Materials Research
IS - 8
ER -