Abstract
Ti and TiNx (x < 1) thin films have been deposited on high speed steel (HSS) substrates by reactive sputtering and then N+ implanted. The increase of the N/Ti ratio of the films during deposition is related to a decrease in their roughness, and N+ implantation produces another additional slight decrease of the roughness. The hardness of samples increases with the nitrogen content in the as-deposited samples; nevertheless, N+-implanted Ti coatings show lower values of hardness than reactive sputtered TiNx films. α-Ti, ∈-Ti2N, and δ-TiN phases were identified by grazing x-ray diffraction.
| Original language | English |
|---|---|
| Pages (from-to) | 2117-2122 |
| Number of pages | 6 |
| Journal | Journal of Materials Research |
| Volume | 13 |
| Issue number | 8 |
| DOIs | |
| Publication status | Published - Aug 1998 |
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