TY - JOUR
T1 - Influence of Surface Roughness on Nanocrystalline Diamond Films Deposited by Distributed Antenna Array Microwave System on TA6V Substrates
AU - Valinattaj Omran, Azadeh
AU - Mahi, Chaimaa
AU - Vayron, Romain
AU - Falentin-Daudré, Céline
AU - Bénédic, Fabien
N1 - Publisher Copyright:
© 2023 by the authors.
PY - 2023/7
Y1 - 2023/7
N2 - In this study, the characteristics of nanocrystalline diamond films synthesized at low surface temperature on Ti-6Al-4V (TA6V) substrates using a distributed antenna array microwave reactor aiming at biomedical applications were investigated. The surface roughness of the TA6V substrates is varied by scratching with emery paper of 1200, 2400, 4000 polishing grit. Nanocrystalline diamond (NCD) coatings with morphology, purity, and microstructure comparable to those obtained on silicon substrates usually employed in the same reactor and growth conditions are successfully achieved whatever the polishing protocol. However, the latter has a significant effect on the roughness parameters and hardness of the NCD films. The use of the finest polishing grit thus permits us to enhance the hardness value, which can be related to the work-hardening phenomenon arising from the polishing process.
AB - In this study, the characteristics of nanocrystalline diamond films synthesized at low surface temperature on Ti-6Al-4V (TA6V) substrates using a distributed antenna array microwave reactor aiming at biomedical applications were investigated. The surface roughness of the TA6V substrates is varied by scratching with emery paper of 1200, 2400, 4000 polishing grit. Nanocrystalline diamond (NCD) coatings with morphology, purity, and microstructure comparable to those obtained on silicon substrates usually employed in the same reactor and growth conditions are successfully achieved whatever the polishing protocol. However, the latter has a significant effect on the roughness parameters and hardness of the NCD films. The use of the finest polishing grit thus permits us to enhance the hardness value, which can be related to the work-hardening phenomenon arising from the polishing process.
KW - biocompatibility
KW - chemical vapor deposition
KW - diamond
KW - thin films
KW - titanium alloys
UR - https://www.scopus.com/pages/publications/85166225852
U2 - 10.3390/coatings13071300
DO - 10.3390/coatings13071300
M3 - Article
AN - SCOPUS:85166225852
SN - 2079-6412
VL - 13
JO - Coatings
JF - Coatings
IS - 7
M1 - 1300
ER -