Reactivity of Cr(CO)6 in atmospheric pressure CVD processes for the growth of various metallurgical coatings

A. Douard; Francis Maury; J. B. Jorcin; N. Pebere; J. P. Bonino; H. Glenat

doi:100000/000

Reactivity of Cr(CO)₆ in atmospheric pressure CVD processes for the growth of various metallurgical coatings

A. Douard
, Francis Maury^*
, J. B. Jorcin
, N. Pebere
, J. P. Bonino
, H. Glenat

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

4 Citations (Scopus)

Abstract

Metalorganic precursors allow a significant decrease of the deposition temperature in CVD processes. When they are employed under atmospheric pressure and using direct liquid injection delivery systems, new processes can be developed for the growth of metallurgical coatings. However, even for a single precursor the great variety of reactive gas phase leads to various coatings with different properties. Original nanocrystalline CrC_xO_y and CrN_xO_y films were deposited in a laminar flow reactor by MOCVD and DLICVD using Cr(CO)₆ as molecular precursor in the temperature range 285-450 °C. Pyrolysis was carried out in different ambient including N₂, H₂, NH₃, THF, and toluene. The influence of the various atmosphere on the composition, structure and, consequently, mechanical properties and corrosion behavior of these coatings is discussed.

Original language	English
Pages (from-to)	24-32
Number of pages	9
Journal	Reviews on Advanced Materials Science
Volume	15
Issue number	1
DOIs	https://doi.org/100000/000
Publication status	Published - Sept 2007
Externally published	Yes

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title = "Reactivity of Cr(CO)6 in atmospheric pressure CVD processes for the growth of various metallurgical coatings",

abstract = "Metalorganic precursors allow a significant decrease of the deposition temperature in CVD processes. When they are employed under atmospheric pressure and using direct liquid injection delivery systems, new processes can be developed for the growth of metallurgical coatings. However, even for a single precursor the great variety of reactive gas phase leads to various coatings with different properties. Original nanocrystalline CrCxOy and CrNxOy films were deposited in a laminar flow reactor by MOCVD and DLICVD using Cr(CO)6 as molecular precursor in the temperature range 285-450 °C. Pyrolysis was carried out in different ambient including N2, H2, NH3, THF, and toluene. The influence of the various atmosphere on the composition, structure and, consequently, mechanical properties and corrosion behavior of these coatings is discussed.",

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T1 - Reactivity of Cr(CO)6 in atmospheric pressure CVD processes for the growth of various metallurgical coatings

AU - Douard, A.

AU - Maury, Francis

AU - Jorcin, J. B.

AU - Pebere, N.

AU - Bonino, J. P.

AU - Glenat, H.

PY - 2007/9

Y1 - 2007/9

N2 - Metalorganic precursors allow a significant decrease of the deposition temperature in CVD processes. When they are employed under atmospheric pressure and using direct liquid injection delivery systems, new processes can be developed for the growth of metallurgical coatings. However, even for a single precursor the great variety of reactive gas phase leads to various coatings with different properties. Original nanocrystalline CrCxOy and CrNxOy films were deposited in a laminar flow reactor by MOCVD and DLICVD using Cr(CO)6 as molecular precursor in the temperature range 285-450 °C. Pyrolysis was carried out in different ambient including N2, H2, NH3, THF, and toluene. The influence of the various atmosphere on the composition, structure and, consequently, mechanical properties and corrosion behavior of these coatings is discussed.

AB - Metalorganic precursors allow a significant decrease of the deposition temperature in CVD processes. When they are employed under atmospheric pressure and using direct liquid injection delivery systems, new processes can be developed for the growth of metallurgical coatings. However, even for a single precursor the great variety of reactive gas phase leads to various coatings with different properties. Original nanocrystalline CrCxOy and CrNxOy films were deposited in a laminar flow reactor by MOCVD and DLICVD using Cr(CO)6 as molecular precursor in the temperature range 285-450 °C. Pyrolysis was carried out in different ambient including N2, H2, NH3, THF, and toluene. The influence of the various atmosphere on the composition, structure and, consequently, mechanical properties and corrosion behavior of these coatings is discussed.

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IS - 1

ER -

Reactivity of Cr(CO)₆ in atmospheric pressure CVD processes for the growth of various metallurgical coatings

Abstract

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