Abstract
Thin film technology has been applied to the development of high-performance sensing devices based on nickel-chromium piezoresistive thin films. These sensing devices combine the high stability piezoresistive properties of an optimized NiCr metallic alloy with the high dielectric performance of a silicon dioxide thin layer, coating a stainless steel substrate. A complete production process, based on sputtering and photolithographic techniques, is proposed. The mechanical and electrical properties of the sensing device have been simultaneously optimized in order to obtain a highly reliable transducer.
| Original language | English |
|---|---|
| Pages (from-to) | 1103-1105 |
| Number of pages | 3 |
| Journal | Vacuum |
| Volume | 45 |
| Issue number | 10-11 |
| DOIs | |
| Publication status | Published - 1994 |
| Externally published | Yes |