Topas-based lab-on-a-chip microsystems fabricated by thermal nanoimprint lithography

B. Bilenberg; M. Hansen; D. Johansen; V. Özkapici; C. Jeppesen; P. Szabo; I. M. Obieta; O. Arroyo; J. O. Tegenfeldt; A. Kristensen

doi:10.1116/1.2091089

Topas-based lab-on-a-chip microsystems fabricated by thermal nanoimprint lithography

B. Bilenberg^*, M. Hansen, D. Johansen, V. Özkapici, C. Jeppesen, P. Szabo, I. M. Obieta, O. Arroyo, J. O. Tegenfeldt, A. Kristensen

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

45 Citations (Scopus)

Abstract

We present a one-step technology for fabrication of Topas-based lab-on-a-chip (LOC) microsystems by the use of thermal nanoimprint lithography (NIL). The technology is demonstrated by the fabrication of two working devices: a particle separator and a LOC with integrated optics for absorbance measurements. These applications demonstrate the fabrication of millimeter to micrometer-sized structures in one lithographic step. The use of NIL makes the technology easily scalable into the nanometer regime by the use of a suitable lithographic technique in the fabrication of the stamp. Processing issues such as environmental stress cracking of the Topas and the requirements to anti-sticking layers on the stamp when imprinting into Topas are discussed.

Original language	English
Pages (from-to)	2944-2949
Number of pages	6
Journal	Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume	23
Issue number	6
DOIs	https://doi.org/10.1116/1.2091089
Publication status	Published - Nov 2005

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Bilenberg, B., Hansen, M., Johansen, D., Özkapici, V., Jeppesen, C., Szabo, P., Obieta, I. M., Arroyo, O., Tegenfeldt, J. O., & Kristensen, A. (2005). Topas-based lab-on-a-chip microsystems fabricated by thermal nanoimprint lithography. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, 23(6), 2944-2949. https://doi.org/10.1116/1.2091089

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title = "Topas-based lab-on-a-chip microsystems fabricated by thermal nanoimprint lithography",

abstract = "We present a one-step technology for fabrication of Topas-based lab-on-a-chip (LOC) microsystems by the use of thermal nanoimprint lithography (NIL). The technology is demonstrated by the fabrication of two working devices: a particle separator and a LOC with integrated optics for absorbance measurements. These applications demonstrate the fabrication of millimeter to micrometer-sized structures in one lithographic step. The use of NIL makes the technology easily scalable into the nanometer regime by the use of a suitable lithographic technique in the fabrication of the stamp. Processing issues such as environmental stress cracking of the Topas and the requirements to anti-sticking layers on the stamp when imprinting into Topas are discussed.",

author = "B. Bilenberg and M. Hansen and D. Johansen and V. {\"O}zkapici and C. Jeppesen and P. Szabo and Obieta, {I. M.} and O. Arroyo and Tegenfeldt, {J. O.} and A. Kristensen",

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Bilenberg, B, Hansen, M, Johansen, D, Özkapici, V, Jeppesen, C, Szabo, P, Obieta, IM, Arroyo, O, Tegenfeldt, JO & Kristensen, A 2005, 'Topas-based lab-on-a-chip microsystems fabricated by thermal nanoimprint lithography', Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, vol. 23, no. 6, pp. 2944-2949. https://doi.org/10.1116/1.2091089

TY - JOUR

T1 - Topas-based lab-on-a-chip microsystems fabricated by thermal nanoimprint lithography

AU - Bilenberg, B.

AU - Hansen, M.

AU - Johansen, D.

AU - Özkapici, V.

AU - Jeppesen, C.

AU - Szabo, P.

AU - Obieta, I. M.

AU - Arroyo, O.

AU - Tegenfeldt, J. O.

AU - Kristensen, A.

PY - 2005/11

Y1 - 2005/11

N2 - We present a one-step technology for fabrication of Topas-based lab-on-a-chip (LOC) microsystems by the use of thermal nanoimprint lithography (NIL). The technology is demonstrated by the fabrication of two working devices: a particle separator and a LOC with integrated optics for absorbance measurements. These applications demonstrate the fabrication of millimeter to micrometer-sized structures in one lithographic step. The use of NIL makes the technology easily scalable into the nanometer regime by the use of a suitable lithographic technique in the fabrication of the stamp. Processing issues such as environmental stress cracking of the Topas and the requirements to anti-sticking layers on the stamp when imprinting into Topas are discussed.

AB - We present a one-step technology for fabrication of Topas-based lab-on-a-chip (LOC) microsystems by the use of thermal nanoimprint lithography (NIL). The technology is demonstrated by the fabrication of two working devices: a particle separator and a LOC with integrated optics for absorbance measurements. These applications demonstrate the fabrication of millimeter to micrometer-sized structures in one lithographic step. The use of NIL makes the technology easily scalable into the nanometer regime by the use of a suitable lithographic technique in the fabrication of the stamp. Processing issues such as environmental stress cracking of the Topas and the requirements to anti-sticking layers on the stamp when imprinting into Topas are discussed.

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DO - 10.1116/1.2091089

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SN - 1071-1023

VL - 23

SP - 2944

EP - 2949

JO - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

JF - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

IS - 6

ER -

Topas-based lab-on-a-chip microsystems fabricated by thermal nanoimprint lithography

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