Enabling patterning of polymer optical devices working at visible wavelength using thermal nano-imprint lithography

Miguel Diez Garcia; Vincent Raimbault; Simon Joly; Laurent Oyhenart; Leire Bilbao; Chi Thanh Nguyen; Isabelle Ledoux-Rak; Laurent Bechou; Isabel Obieta; Corinne Dejous

doi:10.1109/DTIP.2017.7984456

Enabling patterning of polymer optical devices working at visible wavelength using thermal nano-imprint lithography

Miguel Diez Garcia, Vincent Raimbault, Simon Joly, Laurent Oyhenart, Leire Bilbao, Chi Thanh Nguyen, Isabelle Ledoux-Rak, Laurent Bechou, Isabel Obieta, Corinne Dejous

TECNALIA Research & Innovation

Producción científica: Capítulo del libro/informe/acta de congreso › Contribución a la conferencia › revisión exhaustiva

1 Cita (Scopus)

Resumen

Thermal Ultraviolet NanoImprint Lithography is a fast and reliable process to manufacture large scale integrated polymer-based optical components from a soft stamp. This technology already provides polymer integrated components for optical communications operating in the infrared region. However, several fabrication issues must be addressed to enable reliable mass production of optical components working in the visible region, especially when patterning large devices with nanometric features. In this work, we report our fabrication results on grating coupler and optical microring resonators with SU-8 resist. The device is conceived for monomode visible wavelength operation dedicated to future optical sensing applications. For this purpose, sub-micron waveguides are needed. We reported two main defects on soft stamp fabrication: Partial sidewall detachment and shifted or double embossing of the features. Nanoimprinting SU-8 waveguides was achieved with the operational devices of the soft stamp.

Idioma original	Inglés
Título de la publicación alojada	Symposium on Design, Test, Integration and Packaging of MEMS/MOEMS, DTIP 2017
Editores	Benoit Charlot, Pascal Nouet, Claude Pellet, Yoshio Mita, Francis Pressecq, Peter Schneider, Stewart Smith
Editorial	Institute of Electrical and Electronics Engineers Inc.
ISBN (versión digital)	9781538629529
DOI	https://doi.org/10.1109/DTIP.2017.7984456
Estado	Publicada - 18 jul 2017
Evento	19th Symposium on Design, Test, Integration and Packaging of MEMS/MOEMS, DTIP 2017 - Bordeaux, Francia Duración: 29 may 2017 → 1 jun 2017

Serie de la publicación

Nombre	Symposium on Design, Test, Integration and Packaging of MEMS/MOEMS, DTIP 2017

Conferencia

Conferencia	19th Symposium on Design, Test, Integration and Packaging of MEMS/MOEMS, DTIP 2017
País/Territorio	Francia
Ciudad	Bordeaux
Período	29/05/17 → 1/06/17

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10.1109/DTIP.2017.7984456

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Diez Garcia, M., Raimbault, V., Joly, S., Oyhenart, L., Bilbao, L., Nguyen, C. T., Ledoux-Rak, I., Bechou, L., Obieta, I., & Dejous, C. (2017). Enabling patterning of polymer optical devices working at visible wavelength using thermal nano-imprint lithography. En B. Charlot, P. Nouet, C. Pellet, Y. Mita, F. Pressecq, P. Schneider, & S. Smith (Eds.), Symposium on Design, Test, Integration and Packaging of MEMS/MOEMS, DTIP 2017 Artículo 7984456 (Symposium on Design, Test, Integration and Packaging of MEMS/MOEMS, DTIP 2017). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/DTIP.2017.7984456

Diez Garcia, Miguel ; Raimbault, Vincent ; Joly, Simon et al. / Enabling patterning of polymer optical devices working at visible wavelength using thermal nano-imprint lithography. Symposium on Design, Test, Integration and Packaging of MEMS/MOEMS, DTIP 2017. editor / Benoit Charlot ; Pascal Nouet ; Claude Pellet ; Yoshio Mita ; Francis Pressecq ; Peter Schneider ; Stewart Smith. Institute of Electrical and Electronics Engineers Inc., 2017. (Symposium on Design, Test, Integration and Packaging of MEMS/MOEMS, DTIP 2017).

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title = "Enabling patterning of polymer optical devices working at visible wavelength using thermal nano-imprint lithography",

abstract = "Thermal Ultraviolet NanoImprint Lithography is a fast and reliable process to manufacture large scale integrated polymer-based optical components from a soft stamp. This technology already provides polymer integrated components for optical communications operating in the infrared region. However, several fabrication issues must be addressed to enable reliable mass production of optical components working in the visible region, especially when patterning large devices with nanometric features. In this work, we report our fabrication results on grating coupler and optical microring resonators with SU-8 resist. The device is conceived for monomode visible wavelength operation dedicated to future optical sensing applications. For this purpose, sub-micron waveguides are needed. We reported two main defects on soft stamp fabrication: Partial sidewall detachment and shifted or double embossing of the features. Nanoimprinting SU-8 waveguides was achieved with the operational devices of the soft stamp.",

author = "\{Diez Garcia\}, Miguel and Vincent Raimbault and Simon Joly and Laurent Oyhenart and Leire Bilbao and Nguyen, \{Chi Thanh\} and Isabelle Ledoux-Rak and Laurent Bechou and Isabel Obieta and Corinne Dejous",

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doi = "10.1109/DTIP.2017.7984456",

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Diez Garcia, M, Raimbault, V, Joly, S, Oyhenart, L, Bilbao, L, Nguyen, CT, Ledoux-Rak, I, Bechou, L, Obieta, I & Dejous, C 2017, Enabling patterning of polymer optical devices working at visible wavelength using thermal nano-imprint lithography. En B Charlot, P Nouet, C Pellet, Y Mita, F Pressecq, P Schneider & S Smith (eds.), Symposium on Design, Test, Integration and Packaging of MEMS/MOEMS, DTIP 2017., 7984456, Symposium on Design, Test, Integration and Packaging of MEMS/MOEMS, DTIP 2017, Institute of Electrical and Electronics Engineers Inc., 19th Symposium on Design, Test, Integration and Packaging of MEMS/MOEMS, DTIP 2017, Bordeaux, Francia, 29/05/17. https://doi.org/10.1109/DTIP.2017.7984456

Enabling patterning of polymer optical devices working at visible wavelength using thermal nano-imprint lithography. / Diez Garcia, Miguel; Raimbault, Vincent; Joly, Simon et al.
Symposium on Design, Test, Integration and Packaging of MEMS/MOEMS, DTIP 2017. ed. / Benoit Charlot; Pascal Nouet; Claude Pellet; Yoshio Mita; Francis Pressecq; Peter Schneider; Stewart Smith. Institute of Electrical and Electronics Engineers Inc., 2017. 7984456 (Symposium on Design, Test, Integration and Packaging of MEMS/MOEMS, DTIP 2017).

Producción científica: Capítulo del libro/informe/acta de congreso › Contribución a la conferencia › revisión exhaustiva

TY - GEN

T1 - Enabling patterning of polymer optical devices working at visible wavelength using thermal nano-imprint lithography

AU - Diez Garcia, Miguel

AU - Raimbault, Vincent

AU - Joly, Simon

AU - Oyhenart, Laurent

AU - Bilbao, Leire

AU - Nguyen, Chi Thanh

AU - Ledoux-Rak, Isabelle

AU - Bechou, Laurent

AU - Obieta, Isabel

AU - Dejous, Corinne

PY - 2017/7/18

Y1 - 2017/7/18

N2 - Thermal Ultraviolet NanoImprint Lithography is a fast and reliable process to manufacture large scale integrated polymer-based optical components from a soft stamp. This technology already provides polymer integrated components for optical communications operating in the infrared region. However, several fabrication issues must be addressed to enable reliable mass production of optical components working in the visible region, especially when patterning large devices with nanometric features. In this work, we report our fabrication results on grating coupler and optical microring resonators with SU-8 resist. The device is conceived for monomode visible wavelength operation dedicated to future optical sensing applications. For this purpose, sub-micron waveguides are needed. We reported two main defects on soft stamp fabrication: Partial sidewall detachment and shifted or double embossing of the features. Nanoimprinting SU-8 waveguides was achieved with the operational devices of the soft stamp.

AB - Thermal Ultraviolet NanoImprint Lithography is a fast and reliable process to manufacture large scale integrated polymer-based optical components from a soft stamp. This technology already provides polymer integrated components for optical communications operating in the infrared region. However, several fabrication issues must be addressed to enable reliable mass production of optical components working in the visible region, especially when patterning large devices with nanometric features. In this work, we report our fabrication results on grating coupler and optical microring resonators with SU-8 resist. The device is conceived for monomode visible wavelength operation dedicated to future optical sensing applications. For this purpose, sub-micron waveguides are needed. We reported two main defects on soft stamp fabrication: Partial sidewall detachment and shifted or double embossing of the features. Nanoimprinting SU-8 waveguides was achieved with the operational devices of the soft stamp.

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M3 - Conference contribution

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BT - Symposium on Design, Test, Integration and Packaging of MEMS/MOEMS, DTIP 2017

A2 - Charlot, Benoit

A2 - Nouet, Pascal

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A2 - Mita, Yoshio

A2 - Pressecq, Francis

A2 - Schneider, Peter

A2 - Smith, Stewart

PB - Institute of Electrical and Electronics Engineers Inc.

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Diez Garcia M, Raimbault V, Joly S, Oyhenart L, Bilbao L, Nguyen CT et al. Enabling patterning of polymer optical devices working at visible wavelength using thermal nano-imprint lithography. En Charlot B, Nouet P, Pellet C, Mita Y, Pressecq F, Schneider P, Smith S, editores, Symposium on Design, Test, Integration and Packaging of MEMS/MOEMS, DTIP 2017. Institute of Electrical and Electronics Engineers Inc. 2017. 7984456. (Symposium on Design, Test, Integration and Packaging of MEMS/MOEMS, DTIP 2017). doi: 10.1109/DTIP.2017.7984456

Enabling patterning of polymer optical devices working at visible wavelength using thermal nano-imprint lithography

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