Nanopatterned UV curable hydrogels for biomedical applications

Ainhoa Gaston; Ali Z. Khokhar; Leire Bilbao; Virginia Sáez-Martínez; Ana Corres; Isabel Obieta; Nikolaj Gadegaard

doi:10.1016/j.mee.2009.11.089

Nanopatterned UV curable hydrogels for biomedical applications

Ainhoa Gaston, Ali Z. Khokhar, Leire Bilbao, Virginia Sáez-Martínez, Ana Corres, Isabel Obieta, Nikolaj Gadegaard^*

^*Autor correspondiente de este trabajo

Producción científica: Contribución a una revista › Artículo › revisión exhaustiva

9 Citas (Scopus)

Resumen

With an increasing use of emerging patterning technologies such as UV-NIL in biotechnological applications there is at the same time a raising demand for new material for such applications. Here we present a PEG based precursor mixed with a photoinitiator to make it UV sensitive as a new material aimed at biotechnological applications. Using HSQ patterned quartz stamps we observed excellent pattern replication indicating good flow properties of the resist. We were able to obtain imprints with <20 nm residual layer. The PEG based resist has hydrogel properties and it swelling in water was observed by AFM.

Idioma original	Inglés
Páginas (desde-hasta)	1057-1061
Número de páginas	5
Publicación	Microelectronic Engineering
Volumen	87
N.º	5-8
DOI	https://doi.org/10.1016/j.mee.2009.11.089
Estado	Publicada - may 2010

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title = "Nanopatterned UV curable hydrogels for biomedical applications",

abstract = "With an increasing use of emerging patterning technologies such as UV-NIL in biotechnological applications there is at the same time a raising demand for new material for such applications. Here we present a PEG based precursor mixed with a photoinitiator to make it UV sensitive as a new material aimed at biotechnological applications. Using HSQ patterned quartz stamps we observed excellent pattern replication indicating good flow properties of the resist. We were able to obtain imprints with <20 nm residual layer. The PEG based resist has hydrogel properties and it swelling in water was observed by AFM.",

keywords = "Flash imprint, HSQ, PEG, UV-NIL",

author = "Ainhoa Gaston and Khokhar, {Ali Z.} and Leire Bilbao and Virginia S{\'a}ez-Mart{\'i}nez and Ana Corres and Isabel Obieta and Nikolaj Gadegaard",

year = "2010",

month = may,

doi = "10.1016/j.mee.2009.11.089",

language = "English",

volume = "87",

pages = "1057--1061",

journal = "Microelectronic Engineering",

issn = "0167-9317",

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T1 - Nanopatterned UV curable hydrogels for biomedical applications

AU - Gaston, Ainhoa

AU - Khokhar, Ali Z.

AU - Bilbao, Leire

AU - Sáez-Martínez, Virginia

AU - Corres, Ana

AU - Obieta, Isabel

AU - Gadegaard, Nikolaj

PY - 2010/5

Y1 - 2010/5

N2 - With an increasing use of emerging patterning technologies such as UV-NIL in biotechnological applications there is at the same time a raising demand for new material for such applications. Here we present a PEG based precursor mixed with a photoinitiator to make it UV sensitive as a new material aimed at biotechnological applications. Using HSQ patterned quartz stamps we observed excellent pattern replication indicating good flow properties of the resist. We were able to obtain imprints with <20 nm residual layer. The PEG based resist has hydrogel properties and it swelling in water was observed by AFM.

AB - With an increasing use of emerging patterning technologies such as UV-NIL in biotechnological applications there is at the same time a raising demand for new material for such applications. Here we present a PEG based precursor mixed with a photoinitiator to make it UV sensitive as a new material aimed at biotechnological applications. Using HSQ patterned quartz stamps we observed excellent pattern replication indicating good flow properties of the resist. We were able to obtain imprints with <20 nm residual layer. The PEG based resist has hydrogel properties and it swelling in water was observed by AFM.

KW - Flash imprint

KW - HSQ

KW - PEG

KW - UV-NIL

UR - http://www.scopus.com/inward/record.url?scp=76949096291&partnerID=8YFLogxK

U2 - 10.1016/j.mee.2009.11.089

DO - 10.1016/j.mee.2009.11.089

M3 - Article

AN - SCOPUS:76949096291

SN - 0167-9317

VL - 87

SP - 1057

EP - 1061

JO - Microelectronic Engineering

JF - Microelectronic Engineering

IS - 5-8

ER -

Nanopatterned UV curable hydrogels for biomedical applications

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