Nitriding of titanium by hollow cathode assisted active screen plasma and its electro-tribological properties

Engineering

• Nitriding 100%
• Process Parameter 50%
• Physical Vapor Deposition 50%
• Nitriding Process 50%
• Electrical Contact 50%
• Low-Temperature 50%
• Layer Thickness 50%
• Plasma Nitriding 50%
• Nitride 50%
• Strength-to-Weight Ratio 50%
• Good Corrosion Resistance 50%
• Plasma Applications 50%
• Energy dispersive spectrometry 50%