Resumen
The rapid evolution of industrial components, the paradigm of Industry 4.0, and the new connectivity features introduced by 5G technology all increase the likelihood of cybersecurity incidents. These incidents have to be managed to limit or mitigate their impact, and in most cases, they are a consequence of existing vulnerabilities. This scenario raises the need for a tool that enables a faster (tracking the vulnerability state over time) and more precise (detect root cause) response. The defined Extended Dependency Graph (EDG) model is capable to respond to this need, being able to analyze known vulnerabilities for a given device over time. The EDG model can be applied throughout the entire lifespan of a device to track vulnerabilities, identify new requirements, root causes, and test cases. It also helps prioritize patching activities. This chapter defines the key terms used in vulnerability analysis, as well as the current state of the art of vulnerability analysis in both scientific literature and standards. The EDG model is described in more depth together with its fundamental elements: (1) the directed graph representation of the internal structure of the device, (2) the set of quantitative metrics based on the Common Vulnerability Scoring System (CVSS), and (3) the algorithm to build the EDG for a given device.
| Idioma original | Inglés |
|---|---|
| Título de la publicación alojada | CyberSecurity in a DevOps Environment |
| Subtítulo de la publicación alojada | From Requirements to Monitoring |
| Editorial | Springer Nature |
| Páginas | 95-125 |
| Número de páginas | 31 |
| ISBN (versión digital) | 9783031422126 |
| ISBN (versión impresa) | 9783031422119 |
| DOI | |
| Estado | Publicada - 15 dic 2023 |
| Publicado de forma externa | Sí |
ODS de las Naciones Unidas
Este resultado contribuye a los siguientes Objetivos de Desarrollo Sostenible
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ODS 9: Industria, innovación e infraestructura
Huella
Profundice en los temas de investigación de 'Vulnerability detection and response: Current status and new approaches'. En conjunto forman una huella única.Citar esto
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